leaf_stomatal_resistance_ambient

Explore the data for this trait in the portal

• Label: Leaf stomatal water vapour resistance under ambient conditions
• Entity URI: https://w3id.org/APD/traits/trait_0020630
• Type: numeric
• Definition: The stomatal [PO:0008032] water vapour resistance [SWEET:propConductivity/Resistance] of plant leaves [PO:0025034] exposed to ambient [NCIT:C62306] photosynthetically active radiation [ENVO:01001864] levels and ambient atmospheric carbon dioxide [ENVO:01000451] concentrations [PATO:0000033], recorded per unit leaf area [PATO:0001323]. Stomatal resistance is the resistance to the diffusion [NCIT:C82333] of carbon dioxide [CHEBI:16526] through stomata.;Leaf stomatal water vapour resistance under ambient light (photosynthetically active radiation) levels and ambient carbon dioxide concentrations.
• Additional comments: Stomatal resistance is the inverse of leaf stomatal conductance and is regularly used in environmental models and meteorology. An equation converts between stomatal resistance in distance units and stomatal conductance in molar units obtained through gas exchange readings ("Plants and Microclimate" by H.G. Jones (1992), page 55 and Appendix 3; "Elevated Carbon Dioxide Impacts on Soil and Plant Water Relations" by M.B. Kirkham (2011), page 149).
• units: s/m
• allowable range: 10 - 1000000 s/m

See the AusTraits Plant Dictionary (https://w3id.org/APD/traits/trait_0020630) for additional information about this trait.

Coverage

For this trait, AusTraits includes a total of 148 records. This includes:

• data for 4 species.
• data for 3 families.
• data from 1 datasets (see the portal Citations tab for a list of sources)